| 发明名称 |
METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES |
| 摘要 |
Chloropolysilanes are utilized in methods and systems for selectively depositing thin films useful for the fabrication of various devices such as microelectronic and/or microelectromechanical systems (MEMS).
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| 申请公布号 |
KR20090015138(A) |
申请公布日期 |
2009.02.11 |
| 申请号 |
KR20087031348 |
申请日期 |
2008.12.24 |
| 申请人 |
ASM AMERICA, INC. |
发明人 |
TOMASINI PIERRE;WEN JIANQING;BERTRAM RONALD;ARENA CHANTAL;BAUER MATTHIAS;CODY NYLES |
| 分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
| 代理机构 |
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代理人 |
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