| 发明名称 |
ELECTRON BEAM ENHANCED NITRIDING SYSTEM |
| 摘要 |
An electron beam enhanced nitriding system that passes a high-energy electron beam through nitrogen gas to form a low electron temperature plasma capable of delivering nitrogen ions and radicals to a substrate to be nitrided. The substrate can be mounted on an electrode, and the substrate can be biased and heated.
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| 申请公布号 |
US2009032143(A1) |
申请公布日期 |
2009.02.05 |
| 申请号 |
US20080182231 |
申请日期 |
2008.07.30 |
| 申请人 |
WALTON SCOTT G;LEONHARDT DARRIN;MEGER ROBERT A;FERNSLER RICHARD F;MURATORE CHRISTOPHER |
发明人 |
WALTON SCOTT G;LEONHARDT DARRIN;MEGER ROBERT A.;FERNSLER RICHARD F.;MURATORE CHRISTOPHER |
| 分类号 |
C23C8/36;C23C8/24;C23C16/513;H01J37/32;H05H1/20;H05H1/24 |
主分类号 |
C23C8/36 |
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