发明名称 |
Chemical mechanical polishing retaining ring, apparatuses and methods incorporating same |
摘要 |
The disclosure is directed to a chemical mechanical polishing retaining ring including a polymer matrix and a filler including polyimide. The chemical mechanical polishing retaining ring has a wear rate performance not greater than about 75 microns/hour.
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申请公布号 |
US7485028(B2) |
申请公布日期 |
2009.02.03 |
申请号 |
US20050053604 |
申请日期 |
2005.02.08 |
申请人 |
SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION |
发明人 |
WILKINSON DAVID;HAMILTON COLLEEN E.;HIRSCHORN BRYAN DAVID;MANGAUDIS MICHAEL JOHN |
分类号 |
B24B1/00;B23H5/08;B24B37/04;B24B41/06 |
主分类号 |
B24B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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