发明名称 MICRO ELECTRO MECHANICAL SYSTEMS DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an MEMS device with the structure for suppressing the generation of the electric discharge. SOLUTION: A rotating unit 1 includes a first silicon layer 6, and a first frame 2A includes a first silicon layer 6, a second silicon layer 7 and an insulation layer 8. A pair of first actuators 4-1 for generating the electrostatic force to rotate the rotating unit 1 by supplied voltage are arranged at the edge area of the second silicon layer 7 forming the first frame 2A at the opposite side of the rotating unit 1, and at the edge area of the first silicon layer 6 forming the rotating unit 1 at the opposite side of the first frame 2A, further a first boundary part between the first silicon layer 6 and the insulation layer 8, and a second boundary part between the second silicon layer 7 and the insulation layer 8 at the first frame 2A are chamfered at the edge area where the first actuators 4-1 are installed. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009014768(A) 申请公布日期 2009.01.22
申请号 JP20070173188 申请日期 2007.06.29
申请人 FUJITSU LTD 发明人 OMORI YASUHIRO
分类号 G02B26/08;B81B3/00;B81C1/00 主分类号 G02B26/08
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