发明名称 Thin film phase change memory cell formed on silicon-on-insulator substrate
摘要 A memory cell includes a semiconductor feature and a phase change material. The semiconductor feature defines a groove that divides the semiconductor feature into a first electrode and a second electrode. The phase change material at least partially fills this groove and acts to electrically couple the first and second electrodes. At least a portion of the phase change material is operative to switch between lower and higher electrical resistance states in response to an application of a switching signal to at least one of the first and second electrodes. The semiconductor feature comprises silicon and the groove comprises at least one silicon sidewall with a substantially <111> crystal plane orientation.
申请公布号 US7479671(B2) 申请公布日期 2009.01.20
申请号 US20060511680 申请日期 2006.08.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BREITWISCH MATTHEW J.;LAM CHUNG HON;SCHROTT ALEJANDRO GABRIEL
分类号 H01L27/148;H01L23/48;H01L23/52;H01L27/10;H01L29/00;H01L29/40;H01L29/73;H01L29/74;H01L29/768 主分类号 H01L27/148
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