| 摘要 |
PROBLEM TO BE SOLVED: To provide a magnetron sputtering apparatus which can reduce a consumption of a target by efficiently consuming the target, and to provide a method for manufacturing an article having a thin-film formed thereon. SOLUTION: The magnetron sputtering apparatus which sputters the target 10 with plasma has a plurality of magnets 20 that form magnetic fields for confining the plasma and a rotation mechanism 22 for rotating a plurality of magnets 20A and 20B around a rotation center (P). The plurality of the magnets 20A and 20B are arranged so as to form the magnetic fields which extend so as to stride a closed curve in the vicinity of the surface of the target 10. The rotation center (P) is within a region surrounded by the closed curve. The closed curve has a plurality of salients and a plurality of recess parts. Distances between each salient and the rotation center (P) are different from each other, and distances between each recess part and the rotation center (P) are also different from each other. COPYRIGHT: (C)2009,JPO&INPIT
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