Substrates and methods of using those substrates,申请号EP20080252279-传众专利搜索

发明名称	Substrates and methods of using those substrates
摘要	<p>A substrate (CW1) suitable to remove contamination from an apparatus used in lithography, the substrate dimensioned so as to be suitable for handling by the lithographic apparatus, the substrate comprising:a rigid support layer (1); and a deformable layer (2) provided on the rigid support layer.</p>
申请公布号	EP2015140(A1)	申请公布日期	2009.01.14
申请号	EP20080252279	申请日期	2008.07.04
申请人	ASML NETHERLANDS BV	发明人	DE JONG, ANTHONIUS, MARTINUS, CORNELIS, PETRUS;BOUCHOMS, IGOR, PETRUS, MARIA;BRULS, RICHARD JOSEPH;JANSEN, HANS;LEENDERS, MARTINUS, HENDRIKUS, ANTONIUS;WANTEN, PETER, FRANCISCUS;VAN DER HEIJDEN, MARCUS, THEODOOR, WILHELMUS;VAN DER DONCK, JACQUES COR JOHAN;VAN DEN BOGAARD, FREDERICK JOHANNES;GROENEWOLD, JAN;VAN DER GRAAF, SANDRA;ZOLDESI, CARMEN JULIA
分类号	G03F7/20	主分类号	G03F7/20
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