发明名称 IMPLANT HAVING HIGH QUALITY SURFACE AND METHOD FOR SURFACE TREATMENT OF IMPLANT
摘要 An implant in which the surface is reformed and an implant surface processing method are provided to enhance the coherence of the implant and the brain. An implant in which the surface is reformed comprises: a substrate(10) formed of roughness of micro-unit; a barrier layer(20) of the substrate surface; and a nano-tube layer(30) on the barrier layer. The substrate can be made of the pure titanium or made of the titanium alloy by adding one or more metal selected from the aluminum(Al), tantalum(Ta), niobium(Nb), vanadium(V), zirconium(Zr), platinum(Pt), magnesium(Mg), and sodium(Na).
申请公布号 KR20080111243(A) 申请公布日期 2008.12.23
申请号 KR20070059364 申请日期 2007.06.18
申请人 KUPKE+WOLF GMBH KOREA 发明人 RYOO, KYOUNG HO;PARK, KWANG BUM;JEONG, CHEOL WOONG;KIM, HYUN SEUNG;PARK, SANG WON;LEE, KYUNG KU;LEE, DO HJAE;LEE, KWANG MIN
分类号 A61C8/00;A61F2/28 主分类号 A61C8/00
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