发明名称 |
ELECTRON BEAM APPARATUS |
摘要 |
<p>A device for recording or displaying images or for electron lithographic or electron microscopic uses, comprising in an evacuated envelope (1) a target (7) on which at least one electron beam (6) is focussed. This beam is generated by means of a semiconductor device (10) which comprises an electrically insulating layer (42) having an aperture (38) through which the beam passes. The layer carries at least four beam-forming electrodes (43 through 50) which are situated at regular intervals around the aperture (38). Each of the electrodes has such a potential that an n-pole field or a combination of n-pole fields is generated, where n is an even integer from 4 through 16. A suitable choice of the n-pole field will make it possible to impart substantially any desired shape to the beam (6) and thus the focus on the target.</p> |
申请公布号 |
JPS61131331(A) |
申请公布日期 |
1986.06.19 |
申请号 |
JP19850263983 |
申请日期 |
1985.11.26 |
申请人 |
PHILIPS GLOEILAMPENFAB:NV |
发明人 |
ARUTOUURU MARII YUHENE HOEBEREHITSU;HERARUDASU HEHORIUSU PETORASU FUAN HORUKOMU |
分类号 |
H01J29/04;H01J1/308;H01J3/02;H01J3/18;H01J29/48 |
主分类号 |
H01J29/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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