发明名称 BASE FILM FOR PURPOSE TO MANUFACTURE FILM FOR IMPROVING CONTRAST RATIO AND METHOD FOR MANUFACTURING OF PATTERN FOR SHIELDING OUTLIGHT IN CONTRAST RATIO IMPROVEMENT FILM
摘要 A base film for manufacturing a contrast ratio improvement film and a method for manufacturing an external light shielding pattern in a contrast ratio improvement film are provided to prevent an electrostatic effect by forming the external light shielding pattern in a non-contact manner. A base film for manufacturing a contrast ratio improvement film includes a base film(600) and a self-color-changeable chromatophore. The self-color-changeable chromatophore is distributed in the base film. The self-color-changeable chromatophore is color-changed in response of a laser beam. The base film is composed of one or two or more materials selected from polyethylene terephthalate, polycarbonate, polyvinyl chloride, polyester, polymethylmethacrylate, polystyrene, polyestersulfon, polybutadiene, polyesterketone, and polyurethane.
申请公布号 KR20080094150(A) 申请公布日期 2008.10.23
申请号 KR20070038199 申请日期 2007.04.19
申请人 LG CHEM. LTD. 发明人 HAN, SANG CHOLL;OH, SEUNG TAE;MATTHIAS HENYK
分类号 G02B5/20;H01J11/44 主分类号 G02B5/20
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