发明名称 Fabrication process of thin film transistor with phase-separated dielectric structure
摘要 An electronic device including in any sequence: (a) a semiconductor layer, and (b) a phase-separated dielectric structure comprising a lower-k dielectric polymer and a higher-k dielectric polymer, wherein the lower-k dielectric polymer is in a higher concentration than the higher-k dielectric polymer in a region of the dielectric structure closest to the semiconductor layer.
申请公布号 EP1978573(A2) 申请公布日期 2008.10.08
申请号 EP20080152981 申请日期 2008.03.19
申请人 XEROX CORPORATION 发明人 WU, YILIANG;MAHABADI, HADI K.;ONG, BENG S.;SMITH, PAUL F.
分类号 H01L51/40;H01L27/00 主分类号 H01L51/40
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