发明名称 |
Fabrication process of thin film transistor with phase-separated dielectric structure |
摘要 |
An electronic device including in any sequence: (a) a semiconductor layer, and (b) a phase-separated dielectric structure comprising a lower-k dielectric polymer and a higher-k dielectric polymer, wherein the lower-k dielectric polymer is in a higher concentration than the higher-k dielectric polymer in a region of the dielectric structure closest to the semiconductor layer. |
申请公布号 |
EP1978573(A2) |
申请公布日期 |
2008.10.08 |
申请号 |
EP20080152981 |
申请日期 |
2008.03.19 |
申请人 |
XEROX CORPORATION |
发明人 |
WU, YILIANG;MAHABADI, HADI K.;ONG, BENG S.;SMITH, PAUL F. |
分类号 |
H01L51/40;H01L27/00 |
主分类号 |
H01L51/40 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|