| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask for proximity exposure capable of suppressing the sticking of sublimated material originated from a resist. <P>SOLUTION: The photomask for proximity exposure has a pattern made of light shielding material formed on a light-transmissive substrate, wherein a coated film made of a photocatalyst which exhibits photocatalyst action by the exposure light or a coated film including the photocatalyst is formed on the surface on which the pattern is formed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
