| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma-resistant thermal spraying member which is excellent in corrosion resistance against a halogen-based corrosive gas, plasma or the like, and suitably used for a member for a semi-conductor/liquid crystal manufacturing device, etc., in particular, a plasma processor. <P>SOLUTION: In the thermal spraying member, an yttrium-based plasma spray deposit film is deposited on a surface of a base material consisting of a ceramic or a metal. In the spray deposit film, tungsten of ≥5% and <60%, by weight, is dispersed to yttrium, the porosity is ≤5%, and the surface resistivity at the temperature of 20-400°C of the thermal spraying member is ≥10<SP>6</SP>Ωcm and <10<SP>13</SP>Ω cm. <P>COPYRIGHT: (C)2007,JPO&INPIT |
