发明名称 Mg INTERMETALLIC COMPOUND, AND DEVICE APPLYING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a p-type Mg metallic compound (Mg<SB>2</SB>X) excellent in conductivity, and to provide a device using the same. <P>SOLUTION: In the general formula: Mg<SB>2</SB>X that has an inverse fluorite structure (wherein: X is a kind or a plurality of group IV elements), the intermetallic compound contains at least two kinds of acceptor dopants, at least one of which forms a shallow impurity level AL2 near a valence band and at least the other of which forms an impurity level AL1 deeper than the acceptor dopant formed near the valence band. A conduction electron which is formed to a deep donor level DL by a native defect when no element is added, and is captured by a hole formed to a deep impurity level, thereby becoming a p-type. Furthermore, the conduction electron has high conductivity because the hole formed to the shallow impurity level becomes a carrier. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008160077(A) 申请公布日期 2008.07.10
申请号 JP20070297657 申请日期 2007.11.16
申请人 FDK CORP 发明人 KATO AKIHIKO;YAGI TAKESHI
分类号 H01L35/20;C22C23/00;H01L33/28 主分类号 H01L35/20
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