发明名称 THIN POLISHING PAD WITH WINDOW AND MOLDING PROCESS
摘要 A polishing pad is described that has a polishing layer with a polishing surface, an adhesive layer on a side of the polishing layer opposite the polishing layer, and a solid light-transmitting window extending through and molded to the polishing layer. The window has a top surface coplanar with the polishing surface and a bottom surface coplanar with a lower surface of the adhesive layer. A method of making a polishing pad includes forming an aperture through a polishing layer and an adhesive layer, securing a backing piece to the adhesive layer on a side opposite a polishing surface of the polishing layer, dispensing a liquid polymer into the aperture, and curing the liquid polymer to form a window.
申请公布号 US2008305729(A1) 申请公布日期 2008.12.11
申请号 US20080130670 申请日期 2008.05.30
申请人 APPLIED MATERIALS, INC. 发明人 BENVEGNU DOMINIC J.;ZHANG JIMIN;OSTERHELD THOMAS H.;SWEDEK BOGUSLAW A.
分类号 B24D11/00;B29C45/14 主分类号 B24D11/00
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