发明名称 |
CATOPTRIC ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY TOOL |
摘要 |
In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component (400) having a plurality of elements (401). During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements (410) has a curved shape that is different from the arc-shape of the object field. |
申请公布号 |
WO2008149178(A1) |
申请公布日期 |
2008.12.11 |
申请号 |
WO2007IB03547 |
申请日期 |
2007.06.07 |
申请人 |
CARL ZEISS SMT AG;OSSMANN, JENS;ENDRES, MARTIN;STUETZLE, RALF |
发明人 |
OSSMANN, JENS;ENDRES, MARTIN;STUETZLE, RALF |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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