| 摘要 |
<p>A scanning exposure device, which projects a first object image disposed on a first plane onto a second object on a second plane, changes a positioning relation between the first object and the second object with respect to a scanning direction, and transfers and exposes a pattern of the first object onto the second object, is provided with a first viewing field provided on the first plane, a first projection optical system for projecting a magnified image of a part of the first object onto a first projection region on the second plane based on light from the first viewing field, a second viewing filed provided on the second plane, a second projection optical system for projecting a magnified image of a part of the second object onto a second projection region on the first plane based on light from the first viewing field, wherein terms Dm, Dp and F are defined as follows: Dm: a first distance between the first and second viewing fields along the scanning direction; Dp: a second distance between the first and second projection regions on the second plane along the scanning direction; and F: a magnification rate of the first and second projection optical system, and the scanning exposure device is satisfied with the following equation: Dp = F x Dm.</p> |
