发明名称 GALLIUM NITRIDE BASED SEMICONDUCTOR LIGHT EMITTING DIODE AND PROCESS FOR PREPARING THE SAME
摘要 A process for preparing a gallium nitride based semiconductor light emitting diode includes the step of: providing a substrate for growing a gallium nitride based semiconductor material; forming a lower clad layer on the substrate using a first conductive gallium nitride based semiconductor material; forming an active layer on the lower conductive clad layer using an undoped gallium nitride based semiconductor material; forming an upper clad layer on the active layer using a second conductive gallium nitride based semiconductor material; removing at least a portion of the upper clad layer and active layer at a predetermined region so as to expose the corresponding portion of the lower clad layer; and forming, on the upper surface of the upper clad layer, an ohmic contact forming layer made of In<SUB>2</SUB>O<SUB>3 </SUB>including at least one of Zn, Mg and Cu.
申请公布号 US2008286894(A1) 申请公布日期 2008.11.20
申请号 US20080166113 申请日期 2008.07.01
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 CHAE SEUNG WAN;KWAK JUN SUB;SHIN HYOUN SOO;SEO JUN HO
分类号 H01L33/06;H01L33/10;H01L33/32;H01L33/38;H01L33/42 主分类号 H01L33/06
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