| 摘要 |
<p>While a photo mask is arranged in the mask substrate with a certain interval, it has the pellicle film in which hole patterns are arranged in the edge. Accordingly, more efficiently, more efficiently, out-gassed ions can be escaped from the surface of photomask. A photomask comprises a mask substrate(100) having pattern; a pellicle film having the hole pattern(121) which is arranged in the edge, disposed in the mask substrate with a certain interval. To the pellicle having the hole pattern regularly, the pellicle film(120) is formed on the planarized top of the substrate. The arrangement of the hole patterns is imprinted in the edge by making use of the frame for forming hole patterns on the pellicle film.</p> |
