| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To enhance the removal effect of gas impurities in air by efficiently using absorbing liquid, in a gas impurity removal apparatus wherein the absorbing liquid for gas impurity removing is dripped and supplied to gas/liquid contact units, and the absorbing liquid is circulated and used, and new absorbing liquid is replenished while discarding a part of the absorbing liquid. <P>SOLUTION: Pure water 15 is supplied by an absorbing liquid supply means 16 from the upper part of the gas/contact units 12 to moisturize an element 13 in the unit 12 and form a water film. Air flowing through an air flow passage 11 is brought into contact with the water film formed in the element 13 when passing through the units 12 to absorb and remove gas impurities in the air. New pure water is directly dripped and supplied to the gas/liquid contact unit located most down-stream side of the air passage from a replenishing system 18, the pure water dripping through the elements of the respective gas/liquid contact units is contained in a holding vessel 14 at a lower part and circulated and used, and a part of the pure water is discharged. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
