| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film deposition system capable of fixedly retaining the intervals between electrodes. SOLUTION: In the plasma CVD system 10, the upper electrode 13 and the lower electrode 14 are provided so as to be confronted regarding a vertical direction Y. A supporting lift base 18 supports the lower electrode 14, and the lower electrode 14 can be freely dislocated from a movement prohibition position abutted against a spacing control stopper 19 and prohibiting the dislocation of the lower electrode 14 to the upper part Y1 to a movement allowing position separated from the spacing control stopper 19 and allowing the dislocation of the lower electrode 14 to the upper part Y1. Further, the supporting lift base 18 includes spring members 31. COPYRIGHT: (C)2009,JPO&INPIT
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