发明名称 CONTINUOUS PARTICULATE HIGH TEMPERATURE GAS TREATMENT APPARATUS AND METHOD OF TREATING
摘要 A continuous particulate high-temperature gas treatment apparatus with which homogeneous high-temperature gas treatment of particulate can be carried out; a method of treating particulate with the use of the continuous particulate high-temperature gas treatment apparatus. There is provided a continuous particulate high-temperature gas treatment apparatus comprising raw material supply aperture (1) for feeding of a raw material particulate from the superior portion of the apparatus; treating gas supply aperture (2) for feeding of a treating gas; product discharge aperture (3) for discharging of a product having undergone treatment from the inferior portion of the apparatus; treating chamber (4) for treating of the particulate with the treating gas; gas/solid separating chamber (5) disposed on the superior portion of the treating chamber (4) in the relationship of fluid communication; and cooling chamber (6) disposed under the inferior portion of the treating chamber (4) in the relationship of fluid communication. The circumference of the superior portion of the treating chamber (4) is fitted with heating means (7). The circumference of the cooling chamber (6) is fitted with cooling means (8). The apparatus is so constructed that in the driving thereof, moving bed (4a) is formed in the inferior portion of the treating chamber (4) and fluid bed (4b) is continuously formed above the moving bed (4a).
申请公布号 KR20080096688(A) 申请公布日期 2008.10.31
申请号 KR20087021605 申请日期 2006.12.04
申请人 KUREHA CORPORATION 发明人 OHASHI HIROAKI;KAGOSHIMA MASARU;SHIGAKI YOSHIKI
分类号 B01J8/24;B01J6/00;C01B31/02;F26B3/08;H01M4/04;H01M4/133;H01M4/1393;H01M4/58;H01M4/587 主分类号 B01J8/24
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