| 摘要 |
<p>A composition for insulating film is provided to improve the light transmission of short wavelength, and to produce an array substrate including the protective film having small dielectric constant, thereby improving the aperture ratio and light transmission of the array substrate. A composition for insulating film comprises a polymer ; a photoacid generator of the chemical formula 1; and a solvent. In the formula 1, A is a halogen, ether group, C1 - C10 alkyl group, and C1 -C10 alkoxy group; and B is OSO2CF3 or OSO(CF2)3CF3.</p> |
