发明名称 |
Air filtration device, especially for use in nail studio, contains absorption material inside vessel located in air conduit |
摘要 |
#CMT# #/CMT# Pollutants are removed using absorption material (5) inside a vessel (4) in an air conduit (2) which can form a thin layer allowing the device (1) to operate at a much higher air flow rate. #CMT# : #/CMT# A device for removing chemical compounds and solid particles from the surrounding environment, especially for use in a nail studio, comprises an air conduit and a fan (3). A vessel inside the conduit can contain granular absorption material with a total contact surface area resulting in an optimum absorption for a first air flow rate. This material can form a layer which is sufficiently thin and has a high enough contact surface area for a second air flow rate to be used which is at least six and preferably ten times greater than the first flow rate. #CMT#USE : #/CMT# The device is especially useful in a nail studio. #CMT#ADVANTAGE : #/CMT# Harmful pollutants are removed using an energy-efficient device which keeps air flow and noise to a minimum and which uses durable and cheap absorption material. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The figure shows a cross-section of the filtration device incorporated into a work bench. 1 : Filtration device 2 : Air conduit 3 : Fan 4 : Vessel 5 : Granular absorption material #CMT#ENVIRONMENT : #/CMT# The container is a drawer. The first flow rate is at least 25 m3>/h. |
申请公布号 |
NL1033691(C2) |
申请公布日期 |
2008.10.20 |
申请号 |
NL20071033691 |
申请日期 |
2007.04.16 |
申请人 |
GERRIT WILLEM SCHUURMAN |
发明人 |
GERRIT WILLEM SCHUURMAN |
分类号 |
B01D53/04;A45D29/00;B08B15/04 |
主分类号 |
B01D53/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|