发明名称 DEVELOPMENT PROCESS LIQUID AND DEVELOPMENT METHOD FOR LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a development process liquid and a process method for a photosensitive lithographic printing plate which prevent print contamination and achieve stable development even when a running process is carried out for a long period of time with a smaller replenishing amount with the use of an automatic developing machine. <P>SOLUTION: The development process liquid is to be used for a photosensitive lithographic printing plate having at least one photopolymerizable photosensitive layer containing a polymer having a polymerizable double bond in a side chain and having a carboxyl group on a support, and the liquid contains a compound selected from amino acid and its derivatives. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008249874(A) 申请公布日期 2008.10.16
申请号 JP20070089220 申请日期 2007.03.29
申请人 MITSUBISHI PAPER MILLS LTD 发明人 AKAIWA SHOJI;TAKAGAMI YUJI
分类号 G03F7/32;G03F7/00;G03F7/038 主分类号 G03F7/32
代理机构 代理人
主权项
地址