发明名称 |
DEVELOPMENT PROCESS LIQUID AND DEVELOPMENT METHOD FOR LITHOGRAPHIC PRINTING PLATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a development process liquid and a process method for a photosensitive lithographic printing plate which prevent print contamination and achieve stable development even when a running process is carried out for a long period of time with a smaller replenishing amount with the use of an automatic developing machine. <P>SOLUTION: The development process liquid is to be used for a photosensitive lithographic printing plate having at least one photopolymerizable photosensitive layer containing a polymer having a polymerizable double bond in a side chain and having a carboxyl group on a support, and the liquid contains a compound selected from amino acid and its derivatives. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008249874(A) |
申请公布日期 |
2008.10.16 |
申请号 |
JP20070089220 |
申请日期 |
2007.03.29 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
AKAIWA SHOJI;TAKAGAMI YUJI |
分类号 |
G03F7/32;G03F7/00;G03F7/038 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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