METHOD OF FORMING AlGaN CRYSTAL LAYER

摘要

PROBLEM TO BE SOLVED: To provide a method of forming an excellent surface flatness AlGaN crystal layer.

SOLUTION: The AlGaN layer whose surface is substantially flat on atomic level is formed after a buffer layer having a stress relaxation effect and AlGaN layer are formed on a template substrate to which an in-plane compression stress is applied and on which a surface layer being substantially flat on atomic level is formed. More specifically, the buffer layer having the stress relaxation effect is suitably formed by making a second AlN layer using gas mixed with TMA and TMG at 600°C or less to the extent that the mixing ratio of TMA and TMG is 3/17 or more and 6/17 or less if the surface layer of the template substrate comprises the first AlN layer.

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