| 摘要 |
An etching control device is provided to input a management value in chemicals, using a development, corrosion, and peeling controller, for checking an optimal management value. An etching control device comprises a liquid tank(10), a sprayer(13), a plurality of assistant tanks(22), outer chemicals tanks(20), an outer waste liquid(30), a development, corrosion, and peeling controller(140), flow rate sensors(120), and a flow rate transducer(130). The liquid tank stores etching liquid. The assistant tanks and chemical tanks supply various chemicals to the liquid tank. The flow rate sensors detect a flow rate of the chemical liquid which is discharged from each assistant tank. The sprayer supplies the etching liquid which is supplied by a pump(11) through a spraying line(12). The chemical liquid of the chemicals tank is collected in the assistant tanks through a pump(21) and injected to the liquid tank along injection lines(25) through a pump(24). A water level sensor(23) detects the level of the chemicals in the assistant tanks.
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