| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an EUV light source apparatus capable of preventing the deterioration and/or the breakage of a filter for filtering the EUV light. <P>SOLUTION: This EUV light source apparatus comprises an EUV forming chamber 2 wherein the formation of the EUV light is carried out, a target material supply unit 3 for supplying a target material into the EUV forming chamber 2, a laser light source 1 for generating plasma by irradiating the target material supplied into the EUV forming chamber 2 with a laser beam, an EUV light condensing mirror 8 for condensing the EUV light radiated from the plasma, an SPF 14 for filtering the EUV light condensed by the EUV light condensing mirror 8, and an SPF protective plate 15 arranged between the plasma and the SPF 14 for protecting the SPF 14 by blocking the flying objects toward the SPF 14 from the plasma. <P>COPYRIGHT: (C)2008,JPO&INPIT |
