MANUFACTURING METHOD OF ELECTROOPTICAL DEVICE, ELECTROOPTICAL DEVICE, AND ELECTRONIC EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide the manufacturing method of an electrooptical device in which sufficient thickness reduction of a substrate and formation of a conductive film on an electrooptical panel are both compatibly achieved. SOLUTION: First and second conductive films 33 and 34 are formed by applying the coating solution of a conductive material by using an ink jet method, and then the sufficient thickness reduction of the substrate (for example, a second substrate 2) and the formation of the conductive films 33 and 34 on the liquid crystal panel 20 can be both compatibly achieved. Namely, using the ink jet method eliminates the need to process the liquid crystal panel 20 under reduced pressure, and even when the substrate (for example, second substrate 2) of the liquid crystal display panel 20 before the conductive film forming stage is made thin, the conductive films 33 and 34 can be formed on the liquid crystal display panel 20 without causing breakage of the substrate etc. COPYRIGHT: (C)2008,JPO&INPIT