首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Vorrichtung zum Festlegen der Falten oder Plissees von Kleidungsstücken.
摘要
申请公布号
AT117187(B)
申请公布日期
1930.04.10
申请号
ATD117187
申请日期
1928.09.14
申请人
ANETA PLEAT COMPANY LIMITED
发明人
分类号
主分类号
代理机构
代理人
主权项
地址
您可能感兴趣的专利
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
RECIPIENTE CON TAPA CERRADA.
ACTIVE MATERIAL HAVING HIGH CAPACITANCE FOR AN ELECTRODE, MANUFACTURING METHOD THEREOF, ELECTRODE AND ENERGY STORAGE APPARATUS COMPRISING THE SAME
RECLAMATION OF A TITANOSILICATE, AND RECONSTITUTION OF AN ACTIVE OXIDATION CATALYST
Motor vehicle dippable-beam light design procedure uses lens with output surface that can be linked to smooth surface of adjacent modules
Nutritional supplement, useful in a saccharification-fermentation medium to prepare ethanol from a starch-based material by alcoholic fermentation, comprises an active ingredient e.g. ergosterol obtained by fermentation with a mold
DISPOSITIF DE FIXATION DESTINE A DES APPAREILS MEDICAUX
APPAREIL DISTRIBUTEUR DE MATERIAU D'ESSUYAGE AVEC DISPOSITIF LIMITEUR DE BRUIT EN FONCTIONNEMENT
PROCEDE DE SCELLEMENT OU DE SOUDURE DE DEUX ELEMENTS ENTRE EUX
SURFACE PLASMON RESONANCE AND QUARTZ CRYSTAL MICROBALANCE SENSOR
MOBILE COMMUNICATION TERMINAL AND INFORMATION DISPLAY METHODTHEREOF
Plasma Display Panel
FUEL CELL
REMOTE MANAGEMENT METHOD, A RELATED AUTO CONFIGURATION SERVER, A RELATED FURTHER AUTO CONFIGURATION SERVER, A RELATED ROUTING GATEWAY AND A RELATED DEVICE
IDENTIFICATION OF PHOSPHOLIPASE A2 AS TARGET IN CANCER TREATMENT, WITH SPECIAL EMPHASIS ON COLORECTAL CANCER AND ITS MECHANISM OF ACTION
BASE DE PRODUITS COMPOSES DE PLANTES AYANT DES PROPRIETES ST IMULANTES POUR LE SYSTEME NERVEUX ET PSYCHOTROPE,ANTIOXYDANT E ENERGETIQUE APHRODISIAQUE ET DEPURATIVE
PROJECTION SYSTEM
DISPLAY DEVICE FOR REMOVING RESIDUAL IMAGE BASED ON APL AND METHOD FOR REMOVING RESIDUAL IMAGE
METHOD FOR CONTROLLING BACKGROUND APPLICATION, AND MOBILE COMMUNICATION TERMINAL FOR PROCESSING THE SAME
METHOD FOR FORMING COPPER METAL LINES IN SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES