发明名称 SIC SINGLE CRYSTALS WITH REDUCED DISLOCATION DENSITY GROWN BY STEP-WISE PERIODIC PERTURBATION TECHNIQUE
摘要 In a crystal growth method, a seed crystal 8 and a source material 4 are provided in spaced relation inside of a growth crucible 6. Starting conditions for the growth of a crystal 14 in the growth crucible 6 are then established therein. The starting conditions include: a suitable gas inside the growth crucible 6, a suitable pressure of the gas inside the growth crucible 6, and a suitable temperature in the growth crucible 6 that causes the source material 4 to sublimate and be transported via a temperature gradient in the growth crucible 6 to the seed crystal 8 where the sublimated source material precipitates. During growth of the crystal 14 inside the growth crucible 6, at least one of the following growth conditions are intermittently changed inside the growth crucible 6 a plurality of times: the gas in the growth crucible 6, the pressure of the gas in the growth crucible 6, and the temperature in the growth crucible 6.
申请公布号 WO2008039914(A3) 申请公布日期 2008.08.07
申请号 WO2007US79694 申请日期 2007.09.27
申请人 II-VI INCORPORATED;GUPTA, AVINASH;CHAKRABARTI, UTPAL, K.;CHEN, JIHONG;SEMENAS, EDWARD;WU, PING 发明人 GUPTA, AVINASH;CHAKRABARTI, UTPAL, K.;CHEN, JIHONG;SEMENAS, EDWARD;WU, PING
分类号 C30B23/00 主分类号 C30B23/00
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