| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid droplet discharge head manufacturing method capable of manufacturing with high yield a liquid droplet discharge head while densifying nozzles and preventing pressure interference between the nozzles. SOLUTION: This liquid droplet discharge head comprises at least a nozzle substrate having a nozzle hole, a cavity substrate having a discharge chamber, and a reservoir substrate having a recessed section 24 to be a reservoir 23 and a nozzle communication hole 21 communicating with the nozzle hole formed to pass therethrough. A part of the wall of the reservoir is provided with a diaphragm section for absorbing pressure variation. In the photolithography process of an oxidized film in the event of forming the recessed section 24 to be the reservoir 23 on a silicon substrate 200, a protection film 220 is stuck to the whole face opposite the face of the silicon substrate 200 having formed thereon the recessed section 24 to be the reservoir 23 so as to protect the counter face. The sticking of the protection film 200 is carried out under the pressure reduced environment. COPYRIGHT: (C)2008,JPO&INPIT
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