<p>The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.</p>
申请公布号
WO2008094297(A2)
申请公布日期
2008.08.07
申请号
WO2007US73618
申请日期
2007.07.16
申请人
FEI COMPANY;SMITH, NOEL;CHANDLER, CLIVE D.;UTLAUT, MARK W.;TESCH, PAUL P.;TUGGLE, DAVE
发明人
SMITH, NOEL;CHANDLER, CLIVE D.;UTLAUT, MARK W.;TESCH, PAUL P.;TUGGLE, DAVE