发明名称 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS
摘要 A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R<SUB>1 </SUB>to R<SUB>5 </SUB>are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
申请公布号 US2008187864(A1) 申请公布日期 2008.08.07
申请号 US20080021250 申请日期 2008.01.28
申请人 CANON KABUSHIKI KAISHA 发明人 ITO TOSHIKI;YAMAGUCHI TAKAKO
分类号 G03F7/004;C07D311/02;C08F12/08;G03F7/26 主分类号 G03F7/004
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