| 发明名称 |
STRUCTURE FOR REFLECTION LITHOGRAPHY MASK AND METHOD FOR MAKING SAME |
| 摘要 |
<p>The invention concerns a structure for a lithographic reflection mask comprising a receive medium (12) on which is fixed a reflector (11) including at least one layer, the reflector (11) being fixed to the receive medium (12) in a reverse manner relative to a manufacturing medium (10) on which it has previously been manufactured and which is then</p> |
| 申请公布号 |
EP1121622(B1) |
申请公布日期 |
2008.08.06 |
| 申请号 |
EP20000958643 |
申请日期 |
2000.07.28 |
| 申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
ROBIC, JEAN-YVES;ASPAR, BERNARD |
| 分类号 |
G02B5/08;G03F1/24;H01L21/027 |
主分类号 |
G02B5/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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