SELECTIVE REMOVAL CHEMISTRIES FOR SEMICONDUCTOR APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF
摘要
Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H2O content fluorine-based constituent and at least one solvent or solvent mixture.
申请公布号
WO2007095101(A3)
申请公布日期
2008.07.31
申请号
WO2007US03523
申请日期
2007.02.08
申请人
HONEYWELL INTERNATIONAL, INC.;YELLOWAGA, DEBORAH;PALMER, BEN;STARZYNSKI, JOHN;MCFARLAND, JOHN;LOWE, MARIE
发明人
YELLOWAGA, DEBORAH;PALMER, BEN;STARZYNSKI, JOHN;MCFARLAND, JOHN;LOWE, MARIE