发明名称 PHASE-CHANGE SUBSTANCE LAYER AND METHOD OF MANUFACTURING THE SAME, AND PHASE-CHANGE MEMORY DEVICE PROVIDED WITH THE SAME, AND ITS MANUFACTURING METHOD AND OPERATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a phase-change substance layer and method of manufacturing the same, phase-change memory device provided with the same, and its manufacturing method and operation method. SOLUTION: This phase-change substance layer is a compound layer of four components containing indium, and the content (a) of In is 15 at.%&le;a&le;20 at.%, and the phase-change substance layer can be an In<SB>a</SB>Ge<SB>b</SB>Sb<SB>c</SB>Te<SB>d</SB>layer. At this time, the content (b) of Ge can be 10 at.%&le;b&le;15 at.%, the content (c) of Sb can be 20 at.%&le;c&le;25 at.%, and the content (d) of Te can be 40 at.%&le;d&le;55 at.%. COPYRIGHT: (C)2008,JPO&amp;INPIT
申请公布号 JP2008177570(A) 申请公布日期 2008.07.31
申请号 JP20080006200 申请日期 2008.01.15
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KANG YOUN-SEON;NOH JIN-SEO
分类号 H01L45/00;H01L27/105 主分类号 H01L45/00
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