发明名称 TOOL FOR FILM DEPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a tool for film deposition capable of forming a film deposition pattern with its entire periphery being connected in a frame shape or a ring shape. <P>SOLUTION: The tool for film deposition comprises a base member 20 capable of allowing a crystal wafer 10 to be arranged at least on one surface 22 and having the magnetic force by a magnet 21 embedded therein, and a magnetic mask member 30 which is arranged on one surface 22 of the base member 20 and arranged at the position of being attracted by the magnetic force of the magnet 21 embedded in the base member 20. When the crystal wafer 10 is arranged on the base member 20, the crystal wafer 10 can be interposed between the base member 20 and the mask member 30. The mask member 30 is smaller in contour than the crystal wafer in plan view, and a part of the crystal wafer 10 is exposed from the mask member 30 over the entire periphery. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008174767(A) 申请公布日期 2008.07.31
申请号 JP20070006667 申请日期 2007.01.16
申请人 EPSON TOYOCOM CORP 发明人 SHIRAISHI SHIGERU
分类号 C23C14/04;C23C14/50;H01L41/09;H01L41/18;H01L41/22;H01L41/332;H03H3/02 主分类号 C23C14/04
代理机构 代理人
主权项
地址