| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lapping device capable of preventing a practical CMP device from being occupied for many hours to dispense with readjustment and lapping again when attaching a retainer ring for replacement to a polishing head of the practical CMP device after polishing it in advance. <P>SOLUTION: This lapping device is provided with a platen 3 on which the polishing head 1 with the retainer ring is put by letting polishing faces oppose face-to-face and a rotary roller 2 being a mechanism giving driving force for rotating the polishing head 1 with the retainer ring on the platen 3. <P>COPYRIGHT: (C)2008,JPO&INPIT |
