| 摘要 |
An apparatus processing a surface of a substrate is provided to increase a movement volume of reaction gas ion and radical by moving the ion and radical to a processing space through slits formed on a shower head. A plasma generator generates reaction gas plasma by reacting a reaction gas, and a substrate is processed in a processing space. A shower head(240) is provided with plural through-slits(241) for guiding the reaction gas plasma to the processing space. Plural source gas inlet pipes(242) are formed in a space between through-slits on a side of the shower head. The shower head has a buffer space for making distribution of the source gas uniform before the source gas is supplied to the inlet pipe.
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