发明名称 SEMICONDUCTOR DEVICE FABRICATING METHOD
摘要 A semiconductor device may includes a first semiconductor substrate provided on a second semiconductor substrate in a system-in-package arrangement. The first semiconductor substrate may include a plurality of through electrodes formed in first semiconductor substrate. The second semiconductor substrate may include a transistor layer formed over the second semiconductor substrate and a multilayer metal layer formed over the second semiconductor substrate. A plurality of connection electrodes for electrically connecting the first semiconductor substrate to the second semiconductor substrate.
申请公布号 US2008157351(A1) 申请公布日期 2008.07.03
申请号 US20070928939 申请日期 2007.10.30
申请人 HAN JAE-WON 发明人 HAN JAE-WON
分类号 H01L21/50;H01L23/12 主分类号 H01L21/50
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