| 摘要 |
A plasma processing apparatus is provided to decrease a manufacturing cost by forming an antenna implementation region using a ceramic material and the rest region using an aluminum material. A plasma processing apparatus includes an upper chamber(102), a lower chamber(112), and an antenna(108). A lower surface of the upper chamber is opened. An upper surface of the lower chamber is opened. The lower chamber is coupled with the upper chamber to form a process space therein. The antenna is arranged on an outer surface of the upper chamber. The antenna receives a high frequency source to form a plasma atmosphere in the process space. The upper chamber is made by using different materials at an antenna implementation region and the rest regions.
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