发明名称 |
A mask manufacturing method, a method for optical proximity correction, a device manufacturing method, a computer program and a computer readable storage medium |
摘要 |
A method of generating a mask having optical proximity correction features. The method includes the steps of: (a) obtaining a desired target pattern having features to be imaged on a substrate; (b) determining a first focus setting to be utilized when imaging the mask; (c) determining a first interference map based on the target pattern and the first focus setting; (d) determining a first seeding site representing the optimal placement of an assist feature within the mask relative to a feature to be imaged on the basis of the first interference map; (e) selecting a second focus setting which represents a predefined amount of defocus relative to the first focus setting; (f) determining a second interference map based on the target pattern and the second focus setting; (g) determining a second seeding site representing the optimal placement of an assist feature within the mask relative to the feature to be imaged on the basis of the second interference map; and (h) generating an assist feature having a shape which encompasses both the first seeding site and the second seeding site. |
申请公布号 |
EP1630601(A3) |
申请公布日期 |
2008.07.02 |
申请号 |
EP20050255190 |
申请日期 |
2005.08.24 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
VAN DEN BROEKE, DOUGLAS;CHEN, JANG FUNG |
分类号 |
G03F1/00;G03F1/36;G03F7/20 |
主分类号 |
G03F1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|