发明名称 RESISTANCE CHANGE DEVICE AND PROCESS FOR PRODUCING THE SAME
摘要 <p>[PROBLEMS] To provide a resistance change device that is capable of reducing the amount of current flowing per cell as compared with that of the prior art; and a process for producing the same. [MEANS FOR SOLVING PROBLEMS] In resistance change memory (ReRAM) adapted to store data through resistance change of resistance change device (71), the resistance change device (71) is comprised of under electrode (67a) of a noble metal, such as Pt; transition metal film (68a) of a transition metal, such as Ni; transition metal oxide film (69a) of a transition metal oxide, such as NiOx; and upper electrode (70a) of a noble metal, such as Pt.</p>
申请公布号 WO2008075413(A1) 申请公布日期 2008.06.26
申请号 WO2006JP325297 申请日期 2006.12.19
申请人 FUJITSU LIMITED;NOSHIRO, HIDEYUKI 发明人 NOSHIRO, HIDEYUKI
分类号 H01L27/10 主分类号 H01L27/10
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