发明名称 Field Effect Transistor (FET) having nano tube and method of manufacturing the FET
摘要 A transistor includes: a semiconductor substrate; a channel region arranged on the semiconductor substrate; a source and a drain respectively arranged on either side of the channel region; and a conductive nano tube gate arranged on the semiconductor substrate to transverse the channel region between the source and the drain. Its method of manufacture includes: arranging a conductive nano tube on a surface of a semiconductor substrate; defining source and drain regions having predetermined sizes and traversing the nano tube; forming a metal layer on the source and drain regions; removing a portion of the metal layer formed on the nano tube to respectively form source and drain electrodes separated from the metal layer on either side of the nano tube; and doping a channel region below the nano tube arranged between the source and drain electrodes by ion-implanting.
申请公布号 US2008150043(A1) 申请公布日期 2008.06.26
申请号 US20070826170 申请日期 2007.07.12
申请人 CHA SEUNG-NAM;JANG JAE-EUN;JUNG JAE-EUN;JIN YONG-WAN;SONG BYONG-GWON 发明人 CHA SEUNG-NAM;JANG JAE-EUN;JUNG JAE-EUN;JIN YONG-WAN;SONG BYONG-GWON
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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