发明名称 Nitride semiconductor wafer
摘要 A nitride semiconductor substrate having properties preferable for the manufacture of various nitride semiconductor devices is made available, by specifying or controlling the local variation in the off-axis angle of the principal surface of the nitride semiconductor substrate. In a nitride semiconductor single-crystal wafer having a flat principal surface, the crystallographic plane orientation of the principal surface of the nitride semiconductor single-crystal wafer varies locally within a predetermined angular range.
申请公布号 US7390359(B2) 申请公布日期 2008.06.24
申请号 US20060612481 申请日期 2006.12.19
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MIYANAGA MICHIMASA;UEMATSU KOJI;OKAHISA TAKUJI
分类号 C30B25/12;H01L21/205 主分类号 C30B25/12
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