MULTILAYER REFLECTING MIRROR, MULTILAYER REFLECTING MIRROR MANUFACTURING METHOD, OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A multilayer reflecting mirror (2) is provided with a substrate (4), and a multilayer film (6) having a structure wherein first material layers (6a) and second material layers (6b) are alternately formed on the surface of the substrate, and the first material layer in the vicinity of the surface of the multilayer film has thickness distribution within a plane. The multilayer reflecting mirror (2) is provided with an intermediate layer (7) wherein a Si film formed on the surface of the multilayer film or Si is included, and a position of the surface of the intermediate layer is substantially the same as that of the surface of the second material layer. The multilayer reflecting mirror is also provided with a capping layer (8) uniformly formed on the surface of the intermediate layer.