| 摘要 |
A method for fabricating an LCD(Liquid Crystal Display) device is provided to reduce the number of masks by performing simultaneous photo-process of patterning electrodes for process simplification, and to improve the aperture ratio by forming a black matrix to array substrate. The first substrate is divided into a pixel part, the first circuit part and the second circuit part. A black matrix(207) is formed on the pixel part. A buffer layer is formed on the first substrate. An active pattern and the first gate insulation layer are formed at the pixel part and the first and second circuit part. A storage electrode is formed at the upper part of prescribed area of the active pattern of the pixel part. The second gate insulation layer is formed on the first substrate. A gate electrode is formed at the first circuit part. A p+ source/ drain area is formed at prescribed area of the active pattern of the first circuit part. The gate electrode is formed at the pixel part and the second circuit part. A common line(208) is formed at the pixel part. An n+ source/ drain area is formed at prescribed area of the active pattern of the second circuit part and the pixel part. An ILD(Inter Layer Dielectric) is formed on the first substrate. A part of the first and second gate insulation layer and the ILD are removed, and the source/ drain area of the active pattern is exposed respectively. |
