发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having good alkali developability and giving a cured product used for forming protrusions for a liquid crystal display element having excellent liquid crystal alignment property and voltage retention property. <P>SOLUTION: The alkali developable photosensitive resin composition (Q) used for forming protrusions for a liquid crystal display element comprises a hydrophilic resin (A) containing a (meth)acryloyl group and a carboxyl group, a polysiloxane (B) and a photo-radical polymerization initiator (C), wherein the polysiloxane (B) preferably has two or more hydrolyzable alkoxy groups. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008134612(A) 申请公布日期 2008.06.12
申请号 JP20070253710 申请日期 2007.09.28
申请人 SANYO CHEM IND LTD 发明人 YAMAMOTO YUSUKE;OIKE TAKUO
分类号 G03F7/075;G02F1/1337;G03F7/038;G03F7/40 主分类号 G03F7/075
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