| 摘要 |
An exposure apparatus exposes each of a plurality of regions arranged on a substrate. The apparatus includes a processor (9) configured to i) cause a measurement device (7, 8) to acquire an image signal of an alignment mark formed in each of plural regions which are at least a part of the plurality of regions and to measure a position of the alignment mark under a plurality of measurement conditions, ii) calculate a feature value of the signal acquired with respect to each of the plural regions under each of the plurality of measurement conditions, and iii) calculate, with respect to each of the plurality of measurement conditions, a coefficient of a transformation equation which transforms a coordinate of a designed position of the alignment mark to a value that approximate the feature value corresponding to the designed position, and a console (100) configured to display information of the calculated coefficients. |
